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...port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port The good mechanical properties of titanium as a structural material are achieved by strictly controlling the appropriate impurity content and adding alloying elements.At room temperature, the
...port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port The good mechanical properties of titanium as a structural material are achieved by strictly controlling the appropriate impurity content and adding alloying elements.At room temperature, the more
Brand Name:Feiteng
Model Number:Titanium tube target
Place of Origin:Baoji, Shaanxi, China
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...Titanium Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so on are needed. Therefore, the quality of titanium target is very important, and good titanium target can prepare qualified PVD coating. Titanium...
...Titanium Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so on are needed. Therefore, the quality of titanium target is very important, and good titanium target can prepare qualified PVD coating. Titanium... more
Brand Name:Changsheng
Model Number:Titanium Sputtering Target Tube Targets
Place of Origin:China
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...target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target is a titanium
...target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target is a titanium more
Brand Name:LHTI
Model Number:LH-10
Place of Origin:China
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Titanium Sputtering Target 99.5%, 99.95% D100x40mm , D65x6.35mm Purity is the main performance index of the target material, because the purity of the target material has a great influence on the performance of the film. Main performance requirements of target material: Purity is the main performance index of the target material, because the purity of the target...
Titanium Sputtering Target 99.5%, 99.95% D100x40mm , D65x6.35mm Purity is the main performance index of the target material, because the purity of the target material has a great influence on the performance of the film. Main performance requirements of target material: Purity is the main performance index of the target material, because the purity of the target... more
Brand Name:JINXING
Model Number:Titanium Sputtering Target
Place of Origin:China
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... resistance. 3.Grain size uniformity. Customized service. About sputtering Sputtering is essential technology in different industries as follows Architecture glass, PV/Solar,Decoration, Semiconductor,Optics/Optronics, FPD. 1.Packaging ...
... resistance. 3.Grain size uniformity. Customized service. About sputtering Sputtering is essential technology in different industries as follows Architecture glass, PV/Solar,Decoration, Semiconductor,Optics/Optronics, FPD. 1.Packaging ... more
Brand Name:Forged
Model Number:customized
Place of Origin:Luoyang
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Product Information: Product name Gr2 Gr1 DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating Shape round/Square according to your request Density ≥4.51g/cm³ Type As per customers' requirement Standard ASTM ...
Product Information: Product name Gr2 Gr1 DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating Shape round/Square according to your request Density ≥4.51g/cm³ Type As per customers' requirement Standard ASTM ... more
Brand Name:PRM
Model Number:Custom
Place of Origin:China
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... Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium ...
... Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium ... more
Brand Name:GNEE
Model Number:TiP0001
Place of Origin:Henan
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W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum...
W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum... more
Model Number:Tungsten Sputtering Target
Minimum Order Quantity:Negotiate
Price:Negitionable
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Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...
Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ... more
Brand Name:TORICH
Model Number:304L
Place of Origin:China
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... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,
... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass, more
Brand Name:Sanhui
Model Number:Mo1
Place of Origin:Henan, China
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ...
High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ... more
Brand Name:ZCQ
Model Number:ZCQ
Place of Origin:China
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...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for
...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for more
Minimum Order Quantity:500g
Packaging Details:Custom Packaging
Delivery Time:45-60 Workdays
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ...
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ... more
Brand Name:TOBO
Model Number:NI 200
Place of Origin:China
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and
... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and more
Brand Name:ZG
Model Number:MS
Place of Origin:CHINA
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Seamless Titanium Tube Petrochemical ASTM B338 Gr9 Titanium Alloy Tube Bright Surface Technique Seamless or Welded Status Annealed(M) Type Gr9 titanium Seamless Tube Polished Finish titanium coil tube Welded Titanium Tube, Application 1)Power and chemical plant, 2)Automotive components, 3)sports, 4)marine corrosion Titanium mian feature: The density of titanium is 4.506-4.516g/cm^3, melting point is 1668, boiling point is 3535. Therefore Titanium
Seamless Titanium Tube Petrochemical ASTM B338 Gr9 Titanium Alloy Tube Bright Surface Technique Seamless or Welded Status Annealed(M) Type Gr9 titanium Seamless Tube Polished Finish titanium coil tube Welded Titanium Tube, Application 1)Power and chemical plant, 2)Automotive components, 3)sports, 4)marine corrosion Titanium mian feature: The density of titanium is 4.506-4.516g/cm^3, melting point is 1668, boiling point is 3535. Therefore Titanium more
Brand Name:Hongbao
Model Number:HB-TI
Place of Origin:China
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...
Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder... more
Brand Name:PRM
Model Number:custom
Place of Origin:China
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...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target...
...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target... more
Brand Name:HMD
Model Number:NONE
Place of Origin:CHN
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...Titanium Seamless Tubing OD15.8MM*1.2MM For Making U Tube Pure titanium Grade 1 Grade 2 are unalloyed, low strength titanium product containing low oxygen with high formability. Because of all these qualities, this grade is the material of choice for any application where ease of formability is required and is commonly available as titanium plate, tube and bars. Related Product Details Name Soft GR1 Pure Titanium Seamless...
...Titanium Seamless Tubing OD15.8MM*1.2MM For Making U Tube Pure titanium Grade 1 Grade 2 are unalloyed, low strength titanium product containing low oxygen with high formability. Because of all these qualities, this grade is the material of choice for any application where ease of formability is required and is commonly available as titanium plate, tube and bars. Related Product Details Name Soft GR1 Pure Titanium Seamless... more
Brand Name:ZYD
Model Number:ZYD-Ti-Tube
Place of Origin:China
