Fine Grain Size Tungsten Sputtering Target With Hip / Cip / Forge Process
|
...Sputtering Target Tungsten target, WTi sputtering target , The tungsten sputtering target is an important substrate for the tungsten oxide film to realize its functional transition in the semiconductor device. Due to the high melting point of tungsten, tungsten targets are mainly prepared by powder metallurgy Description The tungsten sputtering target......
JINXING MATECH CO LTD
|
Sputtering Target Chromium Cr 100x40mm Hot Isostatic Pressing
|
...sputtering target material is produced by the advanced hot isostatic pressing (HIP) process. sputtering target include rectangular target, arc target, ring target and large aspect ratio integrally formed tube target, etc., with controllable purity and density, and fine and uniform grains , Long service life and other advantages. Purity: 99.5%~99.95%; Forming process: hot isostatic pressing(HIP......
Baoji City Changsheng Titanium Co.,Ltd
|
3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
|
... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
|
Natural Compound Fused Silica Sputtering Target High Temperature Resistant
|
High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
|
99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware
|
... beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target is a titanium product made of titanium metal as...
Baoji Lihua Nonferrous Metals Co., Ltd.
|
Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
|
...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
|
Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
|
... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
|
Molybdenum Planar Sputtering Targets
|
... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
|
Round Molybdenum Products Molybdenum Sputtering Target For Vacuum Sputtering Coating Molybdenum Target Molybdenum Disc
|
... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,...
Shaanxi Peakrise Metal Co.,Ltd
|
DIN2462 Stainless Steel Tubing For Planar Sputtering Target
|
Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ......
TORICH INTERNATIONAL LIMITED
|
Submit your “sputtering target with hip” inquiry in a minute :